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HiPIMS (High Power Impulse Magnetron Sputtering) is a relatively new highly ionized sputtering technique used to deposit engineering quality thin films, with the advantage that the deposition flux can be guided to the substrate through the electrical biasing. As the technique is on the verge of being adopted by the industries, it is necessary to understand its physics very well so that thin films with tailored properties can be deposited. Therefore, time-resolved diagnostic studies have been carried out to get better physical insight of the HiPIMS processes. This book also provides information of lower deposition rates in HiPIMS discharge and suggests its solutions.


Author Anurag Mishra

Product Details


GTIN 9783639716467

Release Date 27.09.2017

Language English

Pages 212

Product type Paperback

Dimension 8.66 x 5.91 x 0.47  inches

Product Weight 11.78 ounces

Transient Properties of HiPIMS Discharges

Anurag Mishra


Seller: Dodax EU

Delivery date: between Tuesday, August 18 and Thursday, August 20

Condition: New

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